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Tuesday, July 28, 2020 | History

4 edition of Electon-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing found in the catalog.

Electon-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing

6-7 March 1991, San Jose, California

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  • 32 Currently reading

Published by SPIE in Bellingham, Wash .
Written in English

    Subjects:
  • Lithography, Electron beam -- Congresses.,
  • X-ray lithography -- Congresses.,
  • Ion beam lithography -- Congresses.

  • Edition Notes

    StatementMartin Peckerar, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.
    SeriesProceedings / SPIE--the International Society for Optical Engineering ;, v. 1465, Proceedings of SPIE--the International Society for Optical Engineering ;, v. 1465.
    ContributionsPeckerar, Martin Charles, 1946-, Society of Photo-optical Instrumentation Engineers.
    Classifications
    LC ClassificationsTK7874 .E4818 1991
    The Physical Object
    Paginationx, 340 p. :
    Number of Pages340
    ID Numbers
    Open LibraryOL1569586M
    ISBN 100819405647
    LC Control Number91061058


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